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Created with Pixso. Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing

Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing

브랜드 이름: ZMSH
MOQ: 10
배달 시간: 2-4 주
지불 조건: 티/티
자세한 정보
원래 장소:
상하이, 중국
재료:
고순도 탄화규소(SiC)
청정:
99.9%
색상:
검은색
밀도:
3.0~3.2g/cm³
포아송의 비율:
0.15~0.21
골절 강인성:
2~4MPa·m^1/2
비커스 경도:
21~28GPa
굴곡강도:
400~600MPa
압축 강도:
2200 MPa
탄성 계수:
400~450GPa
열팽창(20~1000°C):
4–4.6×10^-6/K
열전도율:
100~230W/m·K
최대 작동 온도:
1300~1650°C
전기 저항성:
1~4×10^5Ω·cm
제품 설명

Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing


Product Overview


The Silicon Carbide (SiC) Ceramic Tray is a high-performance tray designed to support semiconductor wafers and other materials in high-temperature and chemically aggressive environments. Known for its excellent corrosion resistance, high thermal stability, and mechanical strength, the SiC tray ensures consistent performance and reliable support for critical processes such as epitaxy, diffusion, oxidation, and high-temperature sintering.


SiC trays are widely used in semiconductor manufacturing, advanced ceramics production, chemical processing, electronics, optical components, aerospace, automotive, and medical device fabrication.


Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing 0Silicon Carbide Ceramic Tray for Semiconductor Wafer Processing 1


Specifications



Property Value
Material High-purity Silicon Carbide (SiC)
Purity 99.9%
Color Black
Density 3.0–3.2 g/cm³
Poisson's Ratio 0.15–0.21
Fracture Toughness 2–4 MPa·m^1/2
Vickers Hardness 21–28 GPa
Flexural Strength 400–600 MPa
Compressive Strength 2200 MPa
Elastic Modulus 400–450 GPa
Thermal Expansion (20–1000°C) 4–4.6×10^-6/K
Thermal Conductivity 100–230 W/m·K
Maximum Operating Temperature 1300–1650°C
Electrical Resistivity 1–4×10^5 Ω·cm
Appearance Smooth, uniform, low-porosity black tray



Manufacturing Methods: Pressureless sintering, hot pressing, CVD coating, reaction-bonded.


Key Features


  1. High Thermal Stability: Maintains performance at extreme temperatures, suitable for sintering and semiconductor processing.

  2. Mechanical Strength: High hardness and load-bearing capacity prevent deformation or cracking.

  3. Chemical Resistance: Withstands strong acids, alkalis, and corrosive chemicals.

  4. Thermal Conductivity: Efficient heat transfer for uniform processing temperatures.

  5. Low Thermal Expansion: Ensures dimensional stability under thermal cycling.

  6. Electrical Insulation: Provides reliable insulation for electronic applications.

  7. CVD Coating Options: Available for enhanced wear resistance and thermal shock protection.

  8. Customizable Sizes & Shapes: Supports specific process requirements.


Applications


  • Semiconductor Manufacturing: Supports LED and wafer chips in epitaxy, diffusion, and oxidation processes.

  • High-Temperature Sintering: Provides stable support for ceramics and metals during sintering.

  • Chemical Processing: Handles aggressive chemicals safely in industrial or laboratory setups.

  • Electronics & Optics Production: Supports substrates and optical components requiring precise thermal control.

  • Aerospace & Automotive: Lightweight, strong trays suitable for components needing thermal management and corrosion resistance.

  • Medical Device Manufacturing: Suitable for chemical-resistant and sterilizable trays.

  • Battery Production & Solar Industry: Supports high-temperature processes for lithium-ion batteries and photovoltaic cells.

  • Laboratory & R&D: Ideal for experiments involving high heat or corrosive materials.

  • Powder Metallurgy & Glass/Ceramic Industry: Ensures uniform heating and reliable process control.


Advantages


  • High purity and chemical inertness reduce contamination risk.

  • Stable mechanical properties under extreme conditions.

  • Excellent wear resistance for long-term use.

  • Lightweight yet durable for easy handling.

  • Versatile for multiple industrial applications.


Packaging



All Silicon Carbide Ceramic Tray are carefully packaged to minimize damage during storage and transportation, ensuring products arrive in pristine condition.


FAQ



1 Can SiC ceramic trays withstand extreme temperatures during semiconductor manufacturing?


Yes, SiC ceramic trays are designed to withstand continuous operating temperatures of up to 1650°C, making them ideal for high-temperature processes such as epitaxy, diffusion, and oxidation in semiconductor and LED production.


2 How resistant are SiC trays to corrosion and chemical exposure?


SiC trays offer outstanding chemical resistance to strong acids, alkalis, plasma, and other corrosive environments. This makes them highly reliable for use in semiconductor processing, chemical reaction vessels, and other harsh industrial environments where material integrity is critical.


3 Are SiC ceramic trays customizable in terms of size, shape, and coating?


Yes, SiC ceramic trays can be customized to meet specific requirements, including dimensions, thickness, and surface finish. Additionally, we offer CVD coatings for enhanced wear resistance and improved thermal shock resistance, depending on your application needs.


Summary



ZMSH Silicon Carbide Ceramic Trays combine thermal, chemical, and mechanical excellence to provide a reliable platform for semiconductor wafers and advanced manufacturing processes. Their high precision, corrosion resistance, and thermal stability make them essential components in modern high-tech industries.



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